Manual Mask Aligner - MJB4
Features and Benefits
- High resolution manual mask aligner capable to print features of 0.5 µm
- Wafer and substrate handling up to 4" (wafers), 4"x4" (substrates)
- Special substrate chucks for pieces, III-V materials, thick substrates, hybrids and HF components
- High precision X, Y, Q alignment stage and microscope manipulator
- High intensity optical setups for different UV- exposure wavelengths up to 90mW/cm²
| Substrate size | 1” up to 100mm / 4” (round) |
|---|---|
| 5 x 5mm up to 100 x 100mm / 4” x 4” (square) | |
| Wafer / Substrate thickness | Up to 4mm |
| Mask size | 2”x 2” up to 5” x 5” |
| Mask thickness | Up to 4.8mm / 190mil |
| Exposure system | |
| Lamp house | 350W |
| Lamp power | 200W, 350W, 500W (DUV with HgXe lamp) |
| Intensity (average over Ø 10mm area) |
200W 40mW/cm² at 405nm |
| 25mW/cm² at 365nm | |
| 350W 80mW/cm² at 405nm | |
| 45mW/cm² at 365nm | |
| 500W 20mW/cm² at 250nm | |
| Uniformity | ± 3% |
| Lamp power supply | |
| CPC (Standard) | Constant power controller for Hg200W or Hg350W |
| CIC1200 | Constant intensity controller for Hg200W, Hg350W & HgXe500W |
| Alignment system | |
| Top side alignment | M500 Singlefield microscope |
| M604 Splitfield microscope | |
| IR alignment | Double transmitted illumination / M500 / one IR camera |
| Single incident illumination / M500 / one IR camera | |
| Double transmitted illumination / M604 / two IR camera | |
| Single incident illumination / M604 / two IR camera | |
| M604 illumination options | Brightfield (standard), Dark field, Interference contrast |
