Production Mask Aligner - MA4/6

Features and Benefits

  • For research, laboratories, limited and pilot production
  • Wafer size up to 6”
  • All contact exposure processes
  • Highly sensitive and fragile materials
  • Thick substrates

The high performance mask aligners for contact exposure processes. Resolution far into the submicron region for silicon and compound semiconductors up to 100mm / 150mm. Substrates and partial wafers up to 4” x 4” / 6” x 6”.