Falcon Coater
Features and Benefits
- Better throughput matching between the scanner / stepper and the cluster for improved fab productivity
- Leading edge process control for 180 and 130 nanometer lithography and beyond
- Short step-up time due the user-friendly graphical interface and industry leading control system
- Unsurpassed flexibility with truly modular architecture allows reconfiguration in the field as technology changes
- High availability and trouble-free interface to all leading DUV and i-line scanners and steppers
- Extremely long life molecular base filtratio
The unique design of the SUSS Falcon micro-lithography cluster gives it the versatility for a wide range of configurations needed to meet diverse customer requirements.
The SUSS Falcon spans the full range of wafer process applications, from exotic R&D and pilot line processes, to high-volume production. The cluster is designed using flexible architecture that allows the configuration of simple, or highly complex, systems using the same robust process modules.